Download Chemical Vapour Deposition - Precursors, Processes and by Jones, Anthony C.; Hitchman, Michael L.(eds.) PDF

By Jones, Anthony C.; Hitchman, Michael L.(eds.)

The ebook is without doubt one of the so much finished overviews ever written at the key features of chemical vapor deposition methods and it really is extra complete, technically special and up to date than different books on CVD. It provides a logical and revolutionary evaluation of a few of the points of CVD strategies. simple options, equivalent to many of the different types of CVD approaches, the layout of CVD reactors, response modeling and CVD precursor chemistry are lined within the first few chapters. Then follows an in depth description of using a spread CVD recommendations to deposit a variety of fabrics, together with semiconductors, metals, steel oxides and nitrides, protecting coatings and useful coatings on glass. eventually and uniquely, for a technical quantity, commercial and advertisement elements of CVD also are mentioned including attainable destiny tendencies, that's an strange, yet vitally important element of the publication. The booklet has been written with CVD practitioners in brain, equivalent to the chemist who needs to profit extra approximately CVD strategies, or the CVD technologist who needs to achieve an elevated wisdom of precursor chemistry. the quantity will end up fairly worthy to people who have lately entered the sector, and it'll additionally make a worthy contribution to chemistry and fabrics technological know-how lecture classes at undergraduate and postgraduate point.

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Extra resources for Chemical Vapour Deposition - Precursors, Processes and Applications

Sample text

74. A. A. Efremov, V. A. Federov and E. E. Grinberg, translated from Vysokchiste Veschestra, No. 3, May-June 1998, pp 5-43, Plenum Publishing Corp. 1989. 75. E. E. Grinberg and A. A. Efremov, Electron. Tekh. Ser. , 1975, 7, 62. 76. V. G. Makarenko, V. A. Federov and A. A. Efremov, Electron. Tekh. Ser. , 1974, 11, 71. 77. A. A. Efremov, E. E. Grinberg, Yu M. Fetisov, USSR Pat. 546,617, Byull. , 1977, 6. 78. H. Kodakura, K. Sawara and T. Yako, U. K. Pat. Application. GB 2,183,651(A), (1987). 79. A.

An impressive research and development effort goes into each industrial CVD system, and it is understandable that companies in a highly competitive environment are not enthusiastic about publishing their trade secrets in a handbook. 3 explains component operation and selection. The rest of the chapter examines the operating principle and system configurations for conventional CVD reactors, liquid injection and aerosol spray delivery systems, atomic layer deposition (ALD) and chemical beam epitaxy (CBE) reactors.

5 CVD Reactors A very large range of reactors and several different precursor delivery systems have been used in the various areas of CVD technology. These are dealt with in detail in Chapter 2, but it may be useful to begin with a brief and general overview of CVD reactors. Irrespective of the variations in CVD processes, all thermal CVD reactors have common features:  Precursor sources.  Gas handling system to control input of precursor gases or vapours to the reaction zone.  A reaction zone, usually within an enclosed cell, with a holder that can accommodate the substrate, and which is heated by a surrounding oven or furnace, or by external radiofrequency or infrared radiation.

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